Produced by electron beam lithography on a silicon single crystal wafer. The standard is composed of three orders of magnitude of checkerboard patterns which allow highly precise measurements. Each standard is one square centimeter placed on the specimen mount of your choice. This is comprised of a 10 x 10 field of one square millimeter. Each square millimeter is comprised of a 10 x 10 field of 0.1 millimeter (100 µm) size - which are again comprised of 0.01 millimeter (10 µm) squares. A total of 125,000 deep-etched squares of 10 x 10 µm show crisp contrast. The periodic structures have an angular precision of approximately 0.2 µm and an angular precision of approximately 5 arc seconds. A specimen may be placed directly on the wafer for accurate measurements. Useful for magnification determination, image distortion, image resolution and selected area diffraction. Normal and electrom beam contamination are easily cleaned from wafer surface.
Specify specimen mount required.
SKU | 53170 |
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Hazardous Materials | No |
Product Brand | --- None --- |
Featured Product | No |
Featured Order | No |